PSP Vacuum Technology

 

 
Ion Source for sample cleaning in UHV

Ion source for cleaning

 
The ISIS3000 ion source produces a high current, variable energy ion beam for the cleaning of sample surfaces in UHV. It is easily adapted to most UHV systems and is supplied complete with a power supply.
 
Features of the sample cleaning ion source
  • Good specifications at an attractive price.
  • Variable energy 100 - 3000 eV
  • High beam current even at low energy
  • Variable beam current for different kinds of samples.
  • Low beam energy for sensitive samples.
  • Higher beam energies for rapid etching.
  • Broad 10 mm spot - no rastering required
  • No differential pumping required - bolts directly to 70 mm flange.
  • Supplied with spacer collar to adjust working distance no extra cost.
  • May be used with any inert gas leaked directly into the source -no need to backfill your chamber.
 
Description of the Ion source
The ion source comprises an oscillating electron discharge source with electrostatic extraction and focusing lens. Inert gas is leaked directly into the discharge chamber where ions are formed at a selected energy of between 100 and 3000 eV. The ions are extracted and focused into a spot of approximately 10 mm diameter at the sample surface where the impact of the energetic ions physically removes surface material thus cleaning the sample.
The gun has a simple rugged design and includes dual filaments to extend in vacuum serviceability. The electronics are 19 inch rack mounting and provide clear analogue metering of beam energy, filament and discharge current.
 
Specifications
Source Electronics
Beam Energy 100 -3000 eV Ion Energy variable 0-3000 eV
Beam Current Typically 15 uA Focus potential 0 -100%
Filament Dual Tungsten/Thorium Filament current 0 to 4 A
Mounting Flange 70 mm OD CF port Anode potential 0 -100%
Working Distance 50 to 150 mm Discharge current metering 0 -100 mA
Sample to Flange up to 310 mm Select filament 1, 2 or OFF
Gas inlet flange 34 mm OD CF The source can be run in discharge current metering stabilized mode for safe unattended operation.
Spot size at sample ~ 10 mm
Operating pressure Typically 5 x 10e-6 mbar 
( depending on pumping speed in the vacuum chamber.)
 
Schematic of the ISIS3000 ion source
 
 
 
Ordering Information
Model No Description
ISIS3000 Ion source complete with electronic control unit, source cable, spare filament assembly and instructions

 

Topac Inc 231 CJC Highway, Cohasset MA 02025 USA
Tel: 781 740 8778 Fax: 781 740 8779 e-mail: sales@topac.com


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